Planar Semiconductor AG
“We manufacture and sell
the world‘s most advanced system.”

The Breakthrough Pulsar™
Wafer Cleaning System

Pulsar™ single wafer systems have been designed to provide the leading-edge wafer cleaning and surface preparation essential for the most advanced integrated circuit manufacturing.

Unique key attributes include:

  • A proprietary cleaning process, enabled by the wafer’s vertical orientation and the gasless hydraulic pulsation of jetted fluids onto its surface, which exploits natural gravitational forces and employs high velocity shearing
  • Extraordinary damage-free cleaning with high defect removal efficiency, even at the most advanced process nodes
  • An innovative patented chamber design which allows scaling to 450mm without increasing the footprint of our 300mm process chamber
  • Usage of multiple dilute chemistries in a single chamber for photoresist strip and clean applications