Planar Semiconductor AG
“Damage-free critical cleaning
and resist/strip solutions.”

Pulsar 3000

The Pulsar™ 3000 – now ready for mass production – stands alone in successfully resolving several yield, cost and technical challenges now affecting production fabs processing wafers at 32nm and smaller (“advanced”) geometries.

 

Pulsar 3000

Pulsar 3000

 

 

 

 

  • High efficiency damage-free cleaning of all surfaces of 300mm wafer simultaneously
  • Photoresist strip and cleaning in same chamber
  • Via and trench cleaning
  • Yield enhancement
  • Advanced recipe management and control of overlapping pulsed jets to maximize strip and cleaning efficiency
  • Wafer reworking to enhance lot production yield
  • Designed for ease of maintenance and service