EXECUTIVE TEAM
Experience & Track Record For Success
Rob Randhawa, BSME – Founder/CEO
Founder of Planar Semiconductor; is the visionary who has conceptualized and led the development of Planar’s unique technologies. Has personally raised nearly $30 million from his various high net worth contacts in the U.S., Australia, Japan, Malaysia, Singapore, and Taiwan.
Started his career in the area of machine design and development of wafer coating and early spray cleaning tools, as well as of an innovative type of robotic platform; several of these technologies were successfully deployed subsequently.
Has authored several patents and technology white papers.
BS in Mechanical Engineering from Bangalore University (India).
William WentWorth – CSO
The company is proud to announce the appointment of Mr. William Wentworth to the position of Chief Strategy Officer of Planar Semiconductor. Mr. Wentworth brings more than 35 years of experience in the semiconductors and technology sector. He has held CEO and SVP positions in both private and public companies and has excelled in creating and executing business strategies, while delivering significant returns for all stakeholders.
Co-Founder of Source Electronics Corporation in 1988 led a majority exit with HIG Capital in 2001. Navigated the business thought the 2001 Technology recession to a successful exit in 2008 to Avnet Inc. (Nasdaq: AVT. Moved to Phoenix (Avnet HQ) where he led the integration and doubled the BU’s revenues in 4 years. Bill moved to Avnet TS as Global Sr. VP of Avnet. Spent 2 years Integrating 12 acquisitions to create Avnet Services. Named New Hampshire’s Entrepreneur of the Year in 2001, Finalist for the Ernst & Young Entrepreneur of Year Award in 1999, 2000, and 2001.
Spending the last 6 years working with Private Equity and Family finding valued assets to invest and grow. Bill brings significant experience in M/A and Utilizing his wealth of experience across the technology sectors.
Jonathan Meyers – CFO
Jonathan Meyers has 40+ years providing capital-raising and financial advisory services to businesses throughout the semiconductor industry (including numerous semiconductor capital equipment companies) as a technology investment banker. He joined Planar in 2014.
Previously, headed technology banking practices at leading firms, including Lehman Brothers and UBS, and co-founded a technology banking boutique (SoundView Technology Group). Has served as a board member of major semiconductor and other technology-driven companies.
Has an MBA from Harvard Business School.
Harry Christov – EVP, Engineering and NPD
Harry Christov has more than 26 years experience in the semiconductor industry. Specializes in new product development, ranging from proof of concepts, design, and engineering to production and support. Recruited in 2005 to manage the team which developed and built Planar’s 300mm wet cleaning production tool. Most recently, designed a next-generation hybrid wet/dry cleaning and drying chamber for Planar.
Managed the development of a multi-chamber dry clean/etch tool for Novellus Systems. Earlier, designed and developed multiple projects for Gasonics International and was a product manager for Genmark Automation.
Has an MS in Electrical Engineering from Technical University (Sofia, Bulgaria) and has authored several patents.
Dr. Fabio Pintchovski – Chief Technical Advisor
Dr. Fabio Pintchovski has 27 years in the semiconductor industry, including 22 years at Motorola, where he defined strategy and directed the development of leading-edge materials and process technologies at its Advanced Products Research and Development Laboratory, and in strategic business development at KLA-Tencor. Has 14 patents granted and is a Motorola Dan Noble Fellow.
Has a Ph.D. in Solid State Chemistry from Brown University.
Madhu Pittan – VP, Process Engineering
Madhu Pittan has been active in the semiconductor industry for over 20 years, including 15 years at Chartered Semiconductor Manufacturing (now GlobalFoundries) as Wet Etch (Clean) Section Manager. Joined Planar Semiconductor in 2014. Interface with various global customers to identify cleaning challenges and to develop wafer cleaning and drying processes (particularly, using “green” chemistries) which address these challenges.
Participates in Planar’s R&D activities, focusing on new tool variants and next-generation process development.
Has a BSc (Hons) in Engineering Business Management from Coventry University (England).
Industry Problems for
advanced IC fabrication – Illustrated
Available Competitive Solutions: critical clean and strip (pre-gate, post-gate, post-implant, silicide, contacts, etc.) performed less than ideally
The Solution:
The Planar Pulsar 3000 Performance
Planar’s Patented Wafer Cleaning Breakthroughs
VERTICAL SINGLE WAFER CLEANING
GASLESS PULSED HYDRO-JET
4 Chemistries
Up to four chemicals (liquids and/or gases) plus DI water – mixed to desired formulation and dilution – can be sprayed on the front and the backside of the wafer simultaneously or separately, with each chemical recipe set differently
Portfolio of “GREEN” Aqueous and Semi-aqueous Chemistries
Yield enhancement results unavailable when using conventional technologies
Planar’s Patent-Pending Wafer Drying Breakthroughs
Pulsed-jet Process Chamber
N2 Atmosphere Exchange Removes Suspended Particles in the Vicinity of the Wafer
N2 Atmosphere Exchange Drying Cycle
Low-speed vertical drying without structure bending or collapsing
Pulsar 3000: Reliability Model Prediction
Illustrative Model of the Pulsar 3000 production tool exceeds lab goals for MTBF
Contributing factors to the outstanding Pulsar 3000 results:
